Learning about microfrabrication

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Masks for sub-micrometer level accuracy are typically produced using advanced techniques such as electron beam lithography, which offers greater precision than traditional light-based methods due to the smaller wavelength of electrons. While lasers can be employed, achieving the necessary positioning accuracy requires sophisticated systems that can control the laser's aim with extreme precision. Light-based methods are limited by diffraction, which restricts accuracy to about 1 - 5 x 10^-7 meters, while interference techniques using UV light can achieve accuracies between 1 - 5 nm. Electron beams, however, provide a more reliable solution for achieving nanometer-level precision due to their smaller wavelength. Overall, while there are theoretical methods to improve light-based accuracy, electron beam lithography remains the preferred choice for high-precision applications.
ChaseRLewis73
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Few questions:

1. How are the masks made for sub micrometer level accuracy. Laser? Namely even with lasers how would they guarantee the positioning system to that level of accuracy to aim the laser how they want?
2. Any recommended books?
 
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Electron beams. Light doesn't suffice.
 
Ya been reading the typical way is lensing of an electron beam. They trace out a larger version (micron to 10 micron accuracy) but have lensing effects that convert that to nanometer accuracy.

Light is diffraction limited at visible wavelengths giving maximum accuracy at about 1 - 5 x 10-7 but is wavelength dependent.

It seems that there are ways around that but none are practically used. Generally interference based methods of UV light (reported accuracies between 1 - 5 nm).

Electron wavelength is just way smaller so it is more accurate.
 

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