Relation between enthelpy of sublimation and rate of sublimation?

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SUMMARY

The discussion centers on the relationship between the enthalpy of sublimation and the rate of sublimation for UO2+x under high-vacuum conditions. The user is conducting experiments to measure sublimation rates but finds no published data on saturated vapor pressure for UO2+x, despite having access to enthalpy of sublimation values. The conclusion drawn from the discussion is that there is no established relationship between enthalpy of sublimation and sublimation rate or saturated vapor pressure.

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DenisH
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TL;DR
Is there a way to get the rate of sublimation of a material in vacuum for a given temperature from its enthalpy of sublimation?
Hello,
I am running experiments where materials are heated at high temperatures during tens of hours under high-vacuum conditions. Since what I am investigating lies in the first hundreds of nanometers of the materials, I must take into account (and anticipate) surface sublimation.
Therefore I am trying to determine at which rate a sample surface is sublimating. I found that this can be calculated from saturated vapor pressure, giving results in consistent with my experimental observations. Unfortunately for the material I am working on (UO2+x), no such saturated vapor pressure has ever been published... but enthalpy of sublimation had been.
At this stage I did not found a relation between enthalpy of sublimation and sublimation rate (or saturated vapor pressure)... my question thus is: is there one?
Thank you
 
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DenisH said:
Summary:: Is there a way to get the rate of sublimation of a material in vacuum for a given temperature from its enthalpy of sublimation?

my question thus is: is there one?
No.
 
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