What is the Formula for Thin Film Interference?

AI Thread Summary
The discussion focuses on the formula for thin film interference, specifically addressing the calculations for destructive interference. A participant calculated the film thickness by dividing the wavelength of 425 nm by 4, resulting in 106 nm, and sought confirmation of this method. The conversation emphasizes the importance of understanding phase shifts during reflection, noting that a phase shift of pi occurs when light reflects off a medium of higher optical density. The provided formulas for constructive and destructive interference highlight the relationship between film thickness, wavelength, and phase shifts. Overall, the thread clarifies the principles behind calculating thin film interference and the significance of phase shifts in these calculations.
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Homework Statement

[PLAIN]http://img403.imageshack.us/img403/2696/33095583.jpg

The attempt at a solution

I simply took 425 nm and divided it by 4 by using the destructive reflection from thin film. I got 106 nm as my answer, which is c. Is this correct?
 
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Precursor said:
I simply took 425 nm and divided it by 4 by using the destructive reflection from thin film.
What's your reasoning behind this?
 
remember your rules of reflection. when an electromagnetic wave is in incidence of a medium of higher optical density the light will have a phase shift of pi. If an electromagnetic wave is incidence on a less optically dense medium there is no shift.

contructive 2mpi = (4(pi)ntcos(x))/lambda -k + b

destructive (2q+1)pi = (4(pi)ntcos(x))/lambda -k + b

where is the phase shift due to the intial and main medium and b is the phase shift due to the main medium and final. x is the angle of incidence which would be 0 in your case. t is film thickness of main medium. n is the index. lambda is wavelength.
 
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