Basic question about measurement of thin film by means of spectral reflectance

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Measuring thin film thickness using spectral reflectance requires careful consideration of the light wavelength in relation to the film thickness. If the film is less than 600 nm thick, using light with a wavelength greater than 600 nm may yield unreliable results, as the wavelength should ideally be smaller than the film thickness for accurate measurement. The first maximum in reflectance occurs when the film is λ/4 thick, which corresponds to a λ/2 path difference and a total phase shift of λ. Therefore, for effective measurements, the wavelength must be appropriately chosen. Understanding these principles is crucial for accurate thin film characterization.
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Hallo alle users,

as the title indicates, I have a question about measurement of thin film thickness by means of spectral reflectance.

Given, the to be measured thin film has thickness less than 600 nm, but the measuring light has only wavelengh larger than 600 nm. Does it mean, that the measurement results with this kind of light is not reliable for the wavelengh of the light is larger than the thickness of the to be measured film. In other words, the wavelength of measuring light should be smaller than the thickness of the to be measure film, shouldn't it?

Thanks a lot in advance!
 
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Light will be reflected with a maximum for the first time when the film is λ/4 thick.
This gives a λ/2 path difference through the film. There is a λ/2 phase shift at the air/film interface giving a total of λ phase shift and therefore a maximum.
So the important distance is λ/4 !
 
Thank you technician!
 
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