SUMMARY
The discussion centers on the challenges of chemically attacking amorphous carbon films, commonly used as hard masks in nanolithography. Users highlight that while oxygen plasma is an effective method for removing amorphous carbon, it can be time-consuming and requires specific equipment like an asher. The possibility of using chemical solvents, such as Piranha solution, is considered, but experts indicate that complete dissociation of amorphous carbon chemically is nearly impossible. Safety precautions, including the use of a fume hood and personal protective gear, are emphasized for any chemical handling.
PREREQUISITES
- Understanding of amorphous carbon properties and applications in nanolithography
- Familiarity with oxygen plasma etching techniques and equipment
- Knowledge of chemical solvents and their effects on carbon materials
- Safety protocols for handling hazardous chemicals in a laboratory environment
NEXT STEPS
- Research the effectiveness of Piranha solution on amorphous carbon films
- Learn about alternative plasma etching methods for carbon removal
- Investigate the operational parameters of oxygen plasma ashers
- Explore safety measures and best practices for chemical handling in cleanroom settings
USEFUL FOR
This discussion is beneficial for materials scientists, cleanroom technicians, and researchers involved in nanolithography and carbon film processing.