Trouble Collecting IR Spectrum of a-Si:H

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Discussion Overview

The discussion revolves around challenges faced in collecting the infrared (IR) spectrum of hydrogenated amorphous silicon (a-Si:H) thin films, specifically focusing on the techniques and materials used in the process. Participants explore issues related to film thickness, substrate choice, and measurement methods.

Discussion Character

  • Technical explanation
  • Experimental/applied
  • Debate/contested

Main Points Raised

  • One participant reports encountering zero signal when attempting to gather an IR spectrum of a-Si:H films deposited on glass microscope slides, suggesting potential issues with contact between the film and the spectrometer's Ge crystal.
  • Another participant points out that glass is opaque in the infrared and recommends using a polished silicon wafer instead, noting that the layer thickness should exceed 1 μm for better results.
  • One participant confirms they are using the ATR method and plans to grow thicker films and switch to a silicon wafer for future measurements.
  • A participant mentions specific frequencies associated with Si-H bonds in the context of IR absorption.
  • Clarification is sought regarding the term "silicon window," leading to a detailed explanation about the characteristics of thick silicon plates and their advantages over thinner silicon wafers.
  • Concerns are raised about the influence of light scattering and interference on the spectra obtained from thinner silicon wafers.

Areas of Agreement / Disagreement

Participants express differing views on the best substrate and thickness for obtaining reliable IR spectra. While some agree on the challenges of using glass and the need for thicker films, there is no consensus on the optimal approach or materials.

Contextual Notes

Participants note limitations related to the thickness of the films and the choice of substrate, as well as the potential impact of interference and scattering on the measurement results.

PSkull
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I am working on my thesis for my masters in physics, and am running into some issues while trying to gather an IR spectrum of my hydrogenated amorphous silicon (a-Si:H). I am depositing my films using PECVD onto a glass microscope slide substrate. The films I have used so far have been 0.2-0.4 μm in thickness. The piece of equipment I am using right is a Thermo Scientific Nicolet iS10 FTIR Spectrometer.

What I am encountering is essentially zero signal. I am not seeing any absorption of IR by my film.

The professor I am working with and I think the reason may be because I do not have good contact with the surface of my film and the Ge crystal in the machine because the films and substrate are to rigid or because my film so far have been to thin.

I would like to know if anyone has any suggestions for me on taking FTIR spectrum of amorphous silicon thin films or of thin film materials in general. Thank you very much for your time.
 
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The glass microscope slide is opaque in the infrared. In principle, you can try the ATR method, but your professor is right, it is not easy to make a good contact with the Ge prism and sample, which is necessary to get a reliable spectrum. Try to deposit the layer on a polished silicon wafer, better on a silicon window of about 1-2 mm thick, and measure transmittance. Also, the layer thickness should be over 1 μm.
See:
http://doc.rero.ch/record/9616/file...orphous_and_microcrystalline_aip_20080731.pdf

ehild
 
Thanks for your help. I am using the ATR method and once I get back into the lab next week I plan on growing thicker films and depositing a silicon wafer.
 
Si-H bond has fundamental frequency near 4.4 μm, second harmonic - 2.25 μm, third - 1.54 μm...
 
Ehild,

I read over your comment again today. What exactly do you mean by a silicon window?
 
It is a thick silicon plate 1-2 mm thick, both sides polished. Its transmittance is about 54% above 2000 cm-1, (wavelength less than 5μm) and free from interference waves at moderate resolution. The spectrum of a commercial one-side polished and 0.5 mm thick or thinner silicon wafer is influenced by light scattering and interference, that you need to take into account when evaluating a spectrum.
The thick silicon plates are expensive, the commercial silicon wafers are cheep, you can use them, but choose 0.5 mm thick ones and select those which do not show too big interference waves.

ehild
 
Last edited:

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