The discussion focuses on the criteria for selecting substrates for thin film deposition, emphasizing the importance of physical and chemical properties. Key factors include the similarity of crystal structure and lattice constants for epitaxial growth, as well as surface characteristics such as hydrophobicity or hydrophilicity based on the solvent type. Techniques mentioned include e-beam evaporation, sputtering, CVD, PECVD, MOCVD, and PVD. The choice of silicon substrates for ZnO thin films is noted, primarily due to availability and compatibility.
PREREQUISITESMaterial scientists, thin film deposition engineers, and researchers involved in semiconductor fabrication and surface science.
ralden said:Hi guys!, i want to know what are the criteria in choosing a substrate to deposit thin films, like what are the physical and chemical properties of the substrate to be compatible in depositing thin films?
Hyo X said:If you are aiming for epitaxy, then the crystal structure and lattice constants of the substrate should be similar to the film you are depositing.
if you want a liquid on a solid then the surface should be hydrophobic or hydrophilic depending on if the solvent is nonpolar or polar.
Using physical deposition, such as e-beam evaporation, you can deposit just about anything on anything else.
Generally you want very clean, flat surfaces.
Also look up sputtering, CVD, PECVD, MOCVD, PVD, etc.