MBE, or molecular beam epitaxy, is a precise technique for controlling crystal growth at the nanoscale, primarily in two dimensions, enabling the creation of designer crystals. It can be combined with e-beam lithography and advanced etching methods to achieve some three-dimensional control. In contrast, nanotechnology is a broader field that includes various methods and applications involving devices at the nanometer scale. While MBE is a specific technique within the realm of nanotechnology, nanotechnology itself encompasses a wider range of practices and innovations. Understanding the distinction between these two concepts is crucial for advancements in materials science and engineering.