Hi, I have deposited a film of dielectric on SiO2 substrate. Then, deposited metal dots on the top of dielectric film to measure electrical properties. I want to measure capacitance using metal dots on the top of dielectric. Since I have SiO2 as a substrate, I can not make a parallel plate capacitance measurement. But someone told me, it is possible to calculate capacitance using only front contacts (two metal dots). It will be very helpful if someone can give a reference to book or article. Thanks.