Measurement of capacitance of dielectric film using front contants

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SUMMARY

The discussion centers on measuring the capacitance of a dielectric film deposited on a SiO2 substrate using front contacts, specifically metal dots. The participants suggest utilizing the Van der Pauw measurement technique to determine the dielectric constant of the thin film, despite the challenges posed by the substrate preventing traditional parallel plate capacitance measurements. References to literature on this method are requested to further support the measurement approach.

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Hi,

I have deposited a film of dielectric on SiO2 substrate. Then, deposited metal dots on the top of dielectric film to measure electrical properties. I want to measure capacitance using metal dots on the top of dielectric. Since I have SiO2 as a substrate, I can not make a parallel plate capacitance measurement. But someone told me, it is possible to calculate capacitance using only front contacts (two metal dots). It will be very helpful if someone can give a reference to book or article.

Thanks.
 
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It believe (not 100% sure) it is possible to use what is essentially a Van der Pauw measurement to measure the capacitance (or rather the dielectric constant) of a thin film. Might be worth looking into. You can definitely use it to measure the surface resistance.
 
Thanks f95toli, I tried to find more material using Van der Pauw measurement for dielectric constant, but I could not find. Please let me know if you can get any reference. I really appreciate your help.

Thanks.
 

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