The choice of substrate significantly impacts the resistivity of VO2 thin films, as evidenced by discussions surrounding the deposition on quartz and aluminum substrates. While resistivity is fundamentally a material-specific property, the substrate can influence the crystal structure and defects within the VO2 film, leading to variations in resistivity. Notably, the phase transition of VO2 occurs around 66 °C, which can further complicate resistivity measurements. Experimental evidence suggests that electronic properties, including resistivity, are affected by the substrate material, as demonstrated by comparisons to other materials like graphene.
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Sorry if I'm missing something obvious, but how can you measure the resistivity of the film when it's deposited on a conducting aluminum substrate?hornboy95 said:I am depositing VO2 thin films on quartz and aluminum substrates
There is no reason to expect (without prior experimental knowledge) the properties of thin films to be the same as for the bulk material. And the resisitivity depends strongly on crystal structure and the defects in the structure, which both may be influenced by the substrate.hornboy95 said:However, resistivity is only a material specific property and since what we are depositing is still only VO2 and I am thinking the structure will be the same (no matter if we use quartz or aluminum substrate), I suspect that the resistivity for both films would be the same.