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Criteria for choosing a substrate for thin films

  1. Jul 3, 2015 #1
    Hi guys!, i want to know what are the criteria in choosing a substrate to deposit thin films, like what are the physical and chemical properties of the substrate to be compatible in depositing thin films?
  2. jcsd
  3. Jul 7, 2015 #2
    If you are aiming for epitaxy, then the crystal structure and lattice constants of the substrate should be similar to the film you are depositing.
    if you want a liquid on a solid then the surface should be hydrophobic or hydrophilic depending on if the solvent is nonpolar or polar.

    Using physical deposition, such as e-beam evaporation, you can deposit just about anything on anything else.
    Generally you want very clean, flat surfaces.
    Also look up sputtering, CVD, PECVD, MOCVD, PVD, etc.
  4. Jul 8, 2015 #3
    I want to deposit ZnO (n-type) thin films in Silicon (p-type) substrate using spray pyrolysis, but i don't know the reasons why many articles choose silicon over other substrates
  5. Jul 14, 2015 #4
    if not for epitaxial growth, then i would guess availability.
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