The discussion focuses on the criteria for selecting substrates for depositing thin films, addressing both physical and chemical properties necessary for compatibility. It includes considerations for various deposition methods and specific material choices.
Participants present multiple viewpoints regarding the criteria for substrate selection, with no consensus reached on the most important factors or the reasons for the preference of silicon as a substrate.
Limitations include the lack of detailed exploration of specific physical and chemical properties required for different deposition methods, as well as the absence of empirical data to support claims regarding substrate preferences.
ralden said:Hi guys!, i want to know what are the criteria in choosing a substrate to deposit thin films, like what are the physical and chemical properties of the substrate to be compatible in depositing thin films?
Hyo X said:If you are aiming for epitaxy, then the crystal structure and lattice constants of the substrate should be similar to the film you are depositing.
if you want a liquid on a solid then the surface should be hydrophobic or hydrophilic depending on if the solvent is nonpolar or polar.
Using physical deposition, such as e-beam evaporation, you can deposit just about anything on anything else.
Generally you want very clean, flat surfaces.
Also look up sputtering, CVD, PECVD, MOCVD, PVD, etc.