EDX vs. XPS: Which is Right for Your Application?

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EDX (Energy-dispersive X-ray spectroscopy) and XPS (X-ray photoelectron spectroscopy) are distinct analytical techniques used for material characterization. EDX analyzes X-rays emitted from a sample to determine elemental composition, while XPS measures photoelectrons emitted from the top 1 to 10 nm of a material's surface. EDX is beneficial for bulk elemental analysis and does not require ultra-high vacuum conditions, whereas XPS provides detailed chemical state information but necessitates UHV conditions. Each technique has its advantages and disadvantages depending on the specific application and required depth of analysis. Understanding these differences is crucial for selecting the appropriate method for material characterization.
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Can someone help explain the difference between EDX(Energy-dispersive X-ray spectroscopy) vs. (XPS) X-ray photoelectron spectroscopy? Which is used for what application? Advantages/Disadvantages of each?

From what I have been reading from documentation, they seem to be the same.

Thanks.
 
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EDX/EDS measures X-rays emitted from a sample, while XPS measures photoelectrons emitted from a sample. They are somewhat related.

"Energy-dispersive X-ray spectroscopy (EDS or EDX) is an analytical technique used for the elemental analysis or chemical characterization of a sample." "To stimulate the emission of characteristic X-rays from a specimen, a high-energy beam of charged particles such as electrons or protons (see PIXE), or a beam of X-rays, is focused into the sample being studied." The process relies on the uniquness of characteristic X-rays of each element.

Ref: http://en.wikipedia.org/wiki/Energy-dispersive_X-ray_spectroscopy

http://micron.ucr.edu/public/manuals/EDS-intro.pdf

http://mee-inc.com/eds.html

http://serc.carleton.edu/research_education/geochemsheets/eds.html


X-ray photoelectron spectroscopy measures the characteristic photoelectrons emitted from a material. XPS spectra are obtained by irradiating a material with a beam of X-rays while simultaneously measuring the kinetic energy and number of electrons that escape from the top 1 to 10 nm of the material being analyzed. XPS requires ultra-high vacuum (UHV) conditions.

Ref: http://en.wikipedia.org/wiki/X-ray_photoelectron_spectroscopy


http://www.phi.com/surface-analysis-techniques/xps.html

http://www.eaglabs.com/mc/x-ray-photoelectron-spectroscopy.html

http://mmrc.caltech.edu/SS_XPS/XPS_PPT/XPS_Slides.pdf
 
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