Chemical treatment of silicon carbide

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SUMMARY

The forum discussion centers on the chemical treatment of bulk silicon carbide (SiC) grit, which was modified to produce crystal clear grains resembling silica. The process is noted to be low-temperature, but the exact method and modifications remain unspecified. Participants emphasize the importance of identifying the patent number related to the original process to ascertain its details and potential applications, particularly in creating thin layers of materials. The conversation highlights ethical concerns regarding the ownership of the discovery and the implications of patent law on modifications and inventions.

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  • Understanding of silicon carbide (SiC) properties and applications
  • Familiarity with patent law and intellectual property rights
  • Knowledge of chemical treatment processes for materials
  • Experience with optical instruments and their documentation
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  • Research the implications of US patent law on modifications of existing patents
  • Investigate chemical treatment methods for silicon carbide and their applications
  • Learn about the process of analyzing materials to determine composition, such as spectroscopy
  • Explore advancements in hybrid thin layer materials and their manufacturing techniques
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Researchers in materials science, patent attorneys, and professionals involved in the development of semiconductor technologies will benefit from this discussion.

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I modified an employer's patented device,in order to treat bulk silicon carbide grit.It became crystal clear resembling clear silica grainsThe resultant was not analyzed.This was a low-temperature process.Is there any potential application for this type of process?
 
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We do not know what the process was, or how you modified that process.
The patent number would help identify the process, especially if there is a US patent number.
What do you think the crystal clear grains might be, why ?
 
Baluncore said:
We do not know what the process was, or how you modified that process.
The patent number would help identify the process, especially if there is a US patent number.
What do you think the crystal clear grains might be, why ?
I thought the clear grains were probably pure silicon dioxide,but they were not analyzed.I must step lightly here,because although my employers did not want the discovery at the time,it probably still belongs to them.I was curious if this result could be used to lay down very thin layers of material by transforming a thin layer of SiC.If it might be useful,I could contact the patent holders.Ethically,I don't know how much more I could disclose.The discovery was 40 years ago,but now I see many people working on hybrid thin layer materials.My discovery was definitely supported by another man's basic work.
 
Your process must have gotten rid of the carbon somehow if the result was SiO2. If the original was 40 years old, wouldn't it be in public domain by now?
 
This thread will go nowhere unless we can get the patent number, or a description of the process and the modification that was employed.

A patent is published from the day it is granted, which is why I asked for the patent number. There is no advantage in keeping the number and date of grant secret. A significant modification might in itself have been an independent invention, but I expect any simple modification will have been published somewhere in the last 50 years so will not be novel, and so cannot be patented now.

I have an undocumented optical instrument here. I followed a patent number back to the 1951 registration in the USA and so now have a very good set of diagrams, with a clear explanation of how everything works and is connected. There are even some interesting extended features disclosed in the patent that are not included in this instrument.

Let's see that patent number, or we may as well abandon this thread.
 

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