Field effect transistors question

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    Field Transistors
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SUMMARY

The discussion focuses on the use of metal transition dichalcogenides (TMDs) as n-type channels in MOSFETs, specifically their role in enhancing carrier mobility. Participants clarify that TMDs serve as the channel material, which can improve electron transport properties compared to traditional silicon channels. The conversation also touches on the effects of gate biasing, including the depletion and accumulation of electrons in the channel, and the tunneling effects observed in advanced FET designs. Understanding these mechanisms is crucial for leveraging TMDs in future semiconductor applications.

PREREQUISITES
  • Understanding of MOSFET operation and structure
  • Knowledge of semiconductor doping types (n-type and p-type)
  • Familiarity with 2D materials, particularly metal transition dichalcogenides
  • Basic principles of field-effect transistors and electron mobility
NEXT STEPS
  • Research the properties and applications of metal transition dichalcogenides in electronics
  • Learn about the mechanisms of electron tunneling in FETs
  • Explore the effects of gate biasing on channel formation in MOSFETs
  • Investigate the advancements in 2D semiconductor technology and their implications for future devices
USEFUL FOR

Electrical engineers, semiconductor researchers, and students interested in advanced materials for transistor applications will benefit from this discussion, particularly those focusing on the integration of 2D materials in electronic devices.

arierreF
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[ Mod note: moved from Elec Eng, might have better luck here]

I have some basic knowledge of how FET work. But i have a question that i can't see the answer.

For example:

In a MOSFET we have a p-doped Silicon substrate. Then we have two n-doped silicons, with a oxide layer above the the p-doped Silicon substrate.

When we increase the gate voltage, we are creating a n-type channel between the n-doped silicons (called the inversion layers). The more we increase the gate voltage the more electrons can move in the n type channel.My question is, why in the recent papers, the new 2D semiconductors, like metal transition dichalcogenides, are used as n type channel?

What is their function? They increase the carriers mobility inside the channel?
 
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The 2D semiconductor IS the channel.
 
w.shockley said:
The 2D semiconductor IS the channel.
I believe the member understands that. As I read it, the question centres on why the use of "metal transition dichalcogenides".
 
arierreF said:
What is their function? They increase the carriers mobility inside the channel?
Your question is confusing...
 
Yes the SC is the channel. But how does it works?

Suppose the we have a MOSFET with n-type semiconductor channel. Like the one that you can seei in link below.

https://www.google.pt/search?q=mos2...3%2Ffig_tab%2Fnnano.2010.279_F3.html;946;1208

We apply a negative bias in gate, so it going to repel the electrons in n-type channel semiconductor. What is the objective of repelling the electrons? Does this repelling works like the depletion (repelling it is going to reduce the width of the channel)?

And if we apply a positive bias in gate. We are accommodating electrons in the interface (n-type semiconductor channel and oxide). Whats the point of this?
 
Last edited:
They talk about a tunnel effect FET. Did you check their ref. 19, which seems to contain a description of the mechanism?
 
For what i see, the tunneling effects can explain the transport of electrons from the source to the n type semiconductor.

But what i don't understand is the mechanism of the capacitor metal-dielectric-ntype SC. I don't see how can we create any depletion here. And how can we induce electrons in the channel? when the channel has already the electrons?

Im my head, we have a ntype semiconductor without any electron in conduction band (ideal situation). If we apply the field effect, then we are giving enough energy to electrons to transit for the conduction band. Now that we have electrons in the conduction band (thinking of it as an inversion layer), we can control the current with the depletion at the drain.

I know that his is wrong, but i can't see its mechanism.
 

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