Measurement of capacitance of dielectric film using front contants

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A dielectric film has been deposited on a SiO2 substrate, with metal dots placed on top for capacitance measurement. Traditional parallel plate capacitance measurement is not feasible due to the substrate. The possibility of using front contacts, specifically a Van der Pauw measurement, to determine the dielectric constant is suggested. However, references for applying this method to measure the dielectric constant of thin films are requested. Further assistance in locating relevant literature on this topic is appreciated.
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Hi,

I have deposited a film of dielectric on SiO2 substrate. Then, deposited metal dots on the top of dielectric film to measure electrical properties. I want to measure capacitance using metal dots on the top of dielectric. Since I have SiO2 as a substrate, I can not make a parallel plate capacitance measurement. But someone told me, it is possible to calculate capacitance using only front contacts (two metal dots). It will be very helpful if someone can give a reference to book or article.

Thanks.
 
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It believe (not 100% sure) it is possible to use what is essentially a Van der Pauw measurement to measure the capacitance (or rather the dielectric constant) of a thin film. Might be worth looking into. You can definitely use it to measure the surface resistance.
 
Thanks f95toli, I tried to find more material using Van der Pauw measurement for dielectric constant, but I could not find. Please let me know if you can get any reference. I really appreciate your help.

Thanks.
 
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