As precipitates and As antisites in GaAs samples are critical to understanding the material's properties, especially in low-temperature growth and subsequent annealing. An As antisite occurs when an arsenic atom occupies a gallium site, while As precipitates form when excess arsenic atoms cluster around defects in the crystal structure. The presence of these features can significantly alter the electronic behavior of GaAs by introducing energy levels within the bandgap. The distribution of arsenic atoms is influenced by factors such as dopants and impurities, including oxygen. Overall, the growth method and conditions play a vital role in determining the formation and impact of these defects in GaAs crystals.