Why do we need a substrate while growing?

  • Thread starter Thread starter Weimin
  • Start date Start date
  • Tags Tags
    Substrate
Weimin
Messages
38
Reaction score
0
Mismatching is the problem in growing materials. I wonder why they did not use the same crystal to grow the sample. For example, GaN is grown on Al203, why not take GaN as the seed?
 
Physics news on Phys.org
That depends on what exactly you want to grow.
It is possible to use the material you want to grow as substrate (homoepitaxy), but sometimes mismatching is not a problem, but highly welcome.
For example the growth of low dimensional heterostructures (quantum dots, quantum wells, ...) requires some mismatching to work.
 
Weimin said:
Mismatching is the problem in growing materials. I wonder why they did not use the same crystal to grow the sample. For example, GaN is grown on Al203, why not take GaN as the seed?

But in many cases, what you want is a pristine surface with a particular crystallographic orientation. If that's the case, you can't just use a pre-made surface that have been exposed to air. So you have to make the film in situ and then study it.

The lattice mismatch for GaN, for example, is mostly solved by depositing a buffer layer first such as AlN. Furthermore, in films such as GaAs, the lattice mismatch is actually desirable because it produces a strain in the film that breaks the degeneracy of the crystal, allowing for the production of spin-polarized photoelectrons.

Zz.
 
I got it, thank you.
 
Also, usually the reason for growing using a deposition method such as MBE, VPE, or CVD as opposed to the Czochralsky method is because the Czochralsky method does not work. Such is the case with AlN, since at temperatures where Al is molten nitrogen is of course a gas so Czochralsky isn't possible. Therefore, AlN wafers are simply not commercially available for epitaxial growth and you need to use a substrate such as sapphire (Al2O3) to grow AlN. However, as mentioned before, the lattice mismatch is not significant usually, and the strain can be minimized by first growing a annealed buffer layer. Then the epitaxial film is grown on the buffer layer.
 
From the BCS theory of superconductivity is well known that the superfluid density smoothly decreases with increasing temperature. Annihilated superfluid carriers become normal and lose their momenta on lattice atoms. So if we induce a persistent supercurrent in a ring below Tc and after that slowly increase the temperature, we must observe a decrease in the actual supercurrent, because the density of electron pairs and total supercurrent momentum decrease. However, this supercurrent...
Hi. I have got question as in title. How can idea of instantaneous dipole moment for atoms like, for example hydrogen be consistent with idea of orbitals? At my level of knowledge London dispersion forces are derived taking into account Bohr model of atom. But we know today that this model is not correct. If it would be correct I understand that at each time electron is at some point at radius at some angle and there is dipole moment at this time from nucleus to electron at orbit. But how...
Back
Top