Why positive PR is the better than negative PR in VLSI

AI Thread Summary
Positive photoresists (PR) have largely replaced negative PR in VLSI fabrication due to their superior process controllability, especially for small geometry features. This shift is attributed to the increasing density of integrated circuits, which allows for more transistors in a given die area. The Rayleigh criterion indicates that positive PR provides better resolution, essential for achieving finer details in modern semiconductor manufacturing. As a result, positive PR is now the dominant choice in the industry. Understanding these advantages is crucial for advancements in VLSI technology.
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As attached, I know basic concept between Positive and Negative PR

But, I confirm this message; Negative resists were popular in the early history of integrated circuit processing, but positive resist gradually became more widely used since they offer better process controllability for small geometry features. Positive resists are now the dominant type of resist used in VLSI fabrication process.

1. Why Positive PR is the better than negative PR in VLSI?
2. Why Positive PR is the better than negative PR about "Resolution" ?

R=K*λ/NA (Rayleigh criterion)

Please.. Answer to me, I'm so curiosity... with Engineertic answer..
 

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Hi
welcome to PF

Negative resists were popular in the early days of integrated circuit processing. Positive resist slowly became more widely used since they offer better process control for small geometry features as dies became higher density. Positive resists are now the main type of resist used in VLSI fabrication processes.


Dave
 
Thanks to Dave!

But What is the meaning of higher density? So, higher density... After what?

Please.. Add to logical answer.
 
higher density = more transistors etc in a given area of the die
 
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