Calculating Fermi Level in Doped Silicon at Room Temperature and 0K

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To calculate the electron and hole concentrations in doped silicon at room temperature, the user found the hole concentration to be 10^15 cm−3 and the electron concentration approximately 1.96 x 10^5 cm−3. The user is uncertain about how to determine the Fermi level, specifically what value to use for the conduction band edge energy (Ec). For part (b), the user is also struggling to find the intrinsic carrier concentration (ni) at 0K. Suggestions for using relevant equations to calculate the Fermi level and intrinsic carrier concentration were provided.
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Homework Statement


(a)If a silicon crystal is doped with 10^15 cm−3 phosphorus atoms, find out the electron
concentrations and hole concentrations in the silicon at room temperature. Find
out the Fermi level.
(b)Repeat at temperature = 0K

Homework Equations


n*p=ni^2
n=2(2pi(n*)kT)^(3/2)exp-[(Ec-Ef)/(kT)] where (n*) = electron effective mass


The Attempt at a Solution


I have calculated the hole concentration p = 10^15 per cm^3
and the electron concentration n = 1.96*10^5 electrons per cm^3

but I am not sure where to begin for calculating the fermi level. I don't know what to plug in for Ec the conduction band edge energy. For part (b) I am also unable to find ni, the intrinsic carrier concentration of silicon at T = 0K. Any suggestions or insight would be appreciated, thanks in advance.
 
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Ef=[(Ec+Ev)/2]+((KT/2))ln(Nc/Nv):if n=p=ni

and i think that you can use Eqs:
Ef==KT*ln{[(1/4)*[e^(Ed/KT)]*([(1+(8Nd/Nc)e^(deltaEd/KT))^(1/2)]-1)}
 
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