I have deposition rate of Silicon dioxide as 1000A/minute. I need to calculate molecular flux to the surface. First I tried to use ideal gas theory but since SiO2 is not ideal gas therefore my answer was completely wrong. I am disoriented. Can any body help. I know the answer is 3.8E15 molecules/cm2 second. Thanks PS: It is not homework assignment. I need to calculate it to determine flux ratio.