Small Gap between parallel plates

AI Thread Summary
Creating a small gap of 10-50nm between two parallel plates made of polished silicon wafers poses challenges, particularly due to van der Waals interactions. Suggestions include using nanoparticles to maintain separation, though concerns about the gap medium arise, as thin oil films are too thick. The need for a mechanism to adjust the gap in response to disturbances is essential, with lithography steppers capable of achieving nanometer-level positioning. Continuous gap measurement could be implemented using capacitance-based techniques. Maintaining parallelism between the plates is also a critical consideration in this setup.
mcodesmart
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Any ideas on how one can make a small gap (~10-50nm) between two parallel plates and maintain a known distance between them. I have two very flat surfaces and I would like to maintain a small gap (known gap) across them. I searched in the literature but I came up with nothing so if you have any ideas, that would be great.
 
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mcodesmart said:
Any ideas on how one can make a small gap (~10-50nm) between two parallel plates and maintain a known distance between them. I have two very flat surfaces and I would like to maintain a small gap (known gap) across them. I searched in the literature but I came up with nothing so if you have any ideas, that would be great.

What are the dimensions of the plates? What are they made of? Do they have a voltage between them?
 
berkeman said:
What are the dimensions of the plates? What are they made of? Do they have a voltage between them?

The dimensions of the plate, (10mmx 10mm) and made from very flat and polished Si wafers. No voltage between them but I understand van dew Waal interactions is an issue at those lengths?
 
Could you put some nano-particles between the plates to keep them seperated.
 
Does the gap have to be air?

I was thinking a film of thin oil but it turns out they tend to be microns or 10s of microns thick so no good for this.
 
Presumably the gap needs to be maintained in the face of potential disturbances, so there is already a need for some distance adjustment mechanism.
Afaik, the steppers for lithography offer positioning to a few nanometers, so presumably one could measure the gap continuously and adjust as needed, probably with a capacitance based gap measuring technique. One issue would be keeping the plates parallel.
 
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