Copper plating a non metallic material

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Discussion Overview

The discussion revolves around the process of copper plating a non-metallic material, focusing on the methods to initiate plating, estimate deposition time, and the challenges associated with adhering a conductive layer to a non-conductive substrate. The scope includes technical explanations and exploratory reasoning related to electroplating techniques.

Discussion Character

  • Technical explanation
  • Exploratory
  • Debate/contested

Main Points Raised

  • One participant seeks to estimate the time required to deposit a 25-thou thick layer of copper using a variable voltage and amperage power supply set at 12 volts.
  • Another participant questions the area of the surface to be plated, emphasizing that the volume of metal deposited is related to current and time.
  • A third participant references Faraday's Law of Electrolysis, explaining the relationship between charge, mass, and area, suggesting that monitoring current flow can help determine plating time.
  • Several participants express uncertainty about how to initiate plating on a non-conducting object, with one noting that the initial conductive layer is crucial for making electrical contact.
  • One participant mentions the use of corona treatment in extrusion coating to create a charged surface for better adhesion, drawing parallels to metallized coatings on plastics.
  • Another participant suggests that metallic vapor deposition could be an alternative method for coating non-conductive materials.
  • It is noted that the electroplating process depends on the spacing between the cathode and the deposition surface, as well as the current density.

Areas of Agreement / Disagreement

Participants express varying levels of understanding and approaches to the problem, with no consensus on the best method to initiate plating on non-conductive materials or the specifics of estimating deposition time.

Contextual Notes

There are limitations in the discussion regarding assumptions about the properties of the non-conductive material, the specifics of the electroplating setup, and the definitions of terms used in the context of plating processes.

wolram
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I want to copper plate a non metallic material I will be using genuine silver paint to coat the material, my problem is how to estimate the time it takes to deposit a layer 25 thou thick.
I have a variable voltage, amperage power supply, i guess it has some thing to do with varying the amperage
if i set the voltage at 12 volts.
The tank i have is 2ft by 1ft by1ft
Any ideas please.
 
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What area? You're going to be plating out some volume of metal; current times time for copper is what?
 
According to Faraday's Law of Electrolysis the charge in coulombs needed to deposit m grams of material with a valence number n and atomic mass M is

Q = 96520⋅ n⋅m/M (coulombs)

To obtain a certain thickness you need the area of the plated surface to get the mass plated. By monitoring the current flow you should be able to obtain the time it takes.
 
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I haven't worked with electroplating before; how do you start the plating of a non-conducting object? It seems more straightforward after you have the initial conducting layer plated on so you can make electrical contact, but I'm not understanding how the first layer adheres to the non-conducting object. Thanks. :smile:
 
berkeman said:
I haven't worked with electroplating before; how do you start the plating of a non-conducting object? It seems more straightforward after you have the initial conducting layer plated on so you can make electrical contact, but I'm not understanding how the first layer adheres to the non-conducting object. Thanks. :smile:

In extrusion coating, i.e. polymer coated paper, the substrate is ionized by corona treatment. This gives the coating a charged surface for the polymer in which to adhere. I imagine a similar process is used for metallized coating on plastic. Mylar is commonly metallized.
 
Electroplating is accomplished by placing the cathode behind the non conductive surface. Electroplate time depends on the spacing between the cathode and deposition surface and current density.
 

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