Chestermiller said:
Hi Starcus,
Problem #2 was a trick problem. Since the fluid is not accelerating, and it is an ideal inviscid fluid (so there is no viscous drag), the pressure distribution in the pipe is exactly the same as it was in Problem #1, when the fluid velocity was zero.
p(x) + ρgx = const.
p(L) = 0
p(0) = ρgL
p(x) = ρg(L-x)
Now for Problem #3:
Reset the fluid velocity back to zero, but, in this case, let the cross sectional area of the pipe (i.e., the pipe radius R) vary as a function of x: A=A(x). Redo the differential force balance on a wafer of fluid contained between locations x and x + Δx, and determine, for this case, how the pressure is varying with vertical location x. Hint: When the cross sectional area is varying like this, the wall of the pipe exerts an axial force in the fluid wafer.
Starcus hasn't responded to my previous post, so I guess he might have lost interest. Anyway, I thought it could be of value to continue the analysis further, for anyone else who had been following the thread.
For Problem #3,
Upward axial force on wafer from fluid below = [itex]p(x)A(x)[/itex]
Downward axial force on wafer from fluid above = [itex]p(x+\Delta x)A(x+\Delta x)[/itex]
Upward axial force from pipe sidewall on wafer = [itex]\frac{p(x)+p(x+\Delta x)}{2}(A(x+\Delta x)-A(x))[/itex]
where [itex]\frac{p(x)+p(x+\Delta x)}{2}[/itex] is the average pressure along the edge of the wafer, and [itex](A(x+\Delta x)-A(x))[/itex] is the difference in projected area of the side wall.
Gravitational force on wafer = [itex]\rho g\frac{A(x)+A(x+\Delta x)}{2}\Delta x[/itex]
Therefore, the force balance on the wafer is:
[itex]p(x)A(x)-p(x+\Delta x)A(x+\Delta x)+\frac{p(x)+p(x+\Delta x)}{2}(A(x+\Delta x)-A(x))-\rho g\frac{A(x)+A(x+\Delta x)}{2}\Delta x =0[/itex]
Taking the limit as Δx approaches zero, we get:
[tex]-\frac{d(pA)}{dx}+p\frac{dA}{dx}-\rho gA=0[/tex]
But, if we differentiate the first term by parts and combine terms, we get:
[tex]-A\frac{dp}{dx}-\rho gA=0[/tex]
Finally, dividing this equation by A, we get:
[tex]-\frac{dp}{dx}=\rho g[/tex]
This is exactly the same equation we got when the cross section area of the pipe was constant. It shows that, in a vessel in which the cross sectional area varies with depth, the hydrostatic equilibrium equation is the same as for the case in which the cross sectional area does not vary.
Now, finally, for Problem #4: SAME AS PROBLEM 3, except that the fluid is now flowing upward in the variable diameter pipe, with a specified volumetric flow rate.
In this case, the fluid velocity v(x) is not a constant along the length of the pipe, but varies inversely with the cross sectional area (we assume here that the diameter variations with x are very gradual, so that the upward velocity can, at all locations, be approximated by a flat velocity profile). Because the axial velocity is varying with x, the fluid is accelerating, and this needs to be taken into account in the force balance on the wafer:
mass of wafer = [itex]\rho g\frac{A(x)+A(x+\Delta x)}{2}\Delta x[/itex]
acceleration of wafer =[itex]v\frac{dv}{dx}[/itex]
Therefore, for Problem #4, the force balance becomes:
[itex]p(x)A(x)-p(x+\Delta x)A(x+\Delta x)+\frac{p(x)+p(x+\Delta x)}{2}(A(x+\Delta x)-A(x))-\rho g\frac{A(x)+A(x+\Delta x)}{2}\Delta x =\rho g\frac{A(x)+A(x+\Delta x)}{2}v\frac{dv}{dx}\Delta x[/itex]
If we divide this equation by Δx, take the limit as Δx approaches zero, and divide the resulting equation by A(x), we obtain:
[tex]\frac{dp}{dx}+\rho g+ρv\frac{dv}{dx}=0[/tex]
or, equivalently,
[tex]\frac{d(p+\rho gx+\rho\frac{ v^2}{2})}{dx}=0[/tex]
Integrating with respect to x gives:
[tex]p+\rho gx+\rho\frac{ v^2}{2}=Const[/tex]
This can be recognized as what we would obtain if we applied the Bernoulli equation to upward flow of an incompressible fluid in a vertical pipe of variable cross section.