- #1
lostinxlation
- 38
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hi
Looking at the cross section of MOS transistor, substrate tap(nMOS) and well tap(pMOS) are done on heavily doped regions. Basically, GND is connected to p+ in nMOS, and VDD is connected to n+ in pMOS.. What could be a problem if we don't have heavily doped regios for substrate and well tappings and VDD and GND are directly connected to n- well and p- substrate ?
Looking at the cross section of MOS transistor, substrate tap(nMOS) and well tap(pMOS) are done on heavily doped regions. Basically, GND is connected to p+ in nMOS, and VDD is connected to n+ in pMOS.. What could be a problem if we don't have heavily doped regios for substrate and well tappings and VDD and GND are directly connected to n- well and p- substrate ?
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