Calculating moleculalar flux from deposition rate.

AI Thread Summary
To calculate the molecular flux of Silicon dioxide from a deposition rate of 1000 Å/minute, ideal gas theory is not applicable due to SiO2's non-ideal behavior. The correct molecular flux is approximately 3.8E15 molecules/cm² per second. The deposition process involves evaporation using an electron gun in ultra-high vacuum conditions of around 10^-9 Torr. Understanding the relationship between deposition rate and molecular flux is crucial for determining flux ratios. Accurate calculations are essential for effective material deposition in thin film applications.
Ravian
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I have deposition rate of Silicon dioxide as 1000A/minute. I need to calculate molecular flux to the surface. First I tried to use ideal gas theory but since SiO2 is not ideal gas therefore my answer was completely wrong. I am disoriented. Can anybody help. I know the answer is 3.8E15 molecules/cm2 second.
Thanks

PS: It is not homework assignment. I need to calculate it to determine flux ratio.
 
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What is the process for deposition?
 
It is evaporated using e-gun in UHV of around 10-9 Torr.
 
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