Discussion Overview
The discussion revolves around the chemical attack of amorphous carbon films, specifically exploring methods for their removal or dissociation using chemical solvents versus plasma techniques. Participants share experiences and propose potential solutions while questioning the effectiveness and practicality of various approaches.
Discussion Character
- Exploratory
- Technical explanation
- Debate/contested
Main Points Raised
- One participant inquires about the possibility of completely dissociating amorphous carbon in a chemical solvent.
- Another participant mentions that amorphous carbon is commonly removed using oxygen plasma in nanolithography applications and questions the availability of such equipment.
- A participant expresses concern about the time required for oxygen plasma removal and suggests exploring chemical etching methods, such as using acids or bases.
- One suggestion for a chemical method includes using Piranha solution, with a caution about safety requirements.
- A colleague's input indicates that chemically removing amorphous carbon is nearly impossible, raising questions about the efficiency of oxygen plasma removal and the time involved in the process.
Areas of Agreement / Disagreement
Participants do not reach a consensus on the effectiveness of chemical methods for removing amorphous carbon, with some suggesting it is difficult while others propose potential solutions. The discussion remains unresolved regarding the best approach.
Contextual Notes
Participants express uncertainty about the efficiency and practicality of different removal methods, highlighting the limitations of chemical solvents and the time required for plasma techniques. Specific conditions and assumptions regarding equipment availability and safety measures are also noted.