Deleted member 655103
Hello,
I have a question about secondary ions entering a mass filter in Secondary Ion Mass Sprectrometry (SIMS).
We know that secondary ions are sputtered from surface of studied sample. Those secondary ions are entering a mass filter which sort them out due to their mass/charge ratio. After that they enter a deterctor.
We use quadrupole mass filters, magnetic sector filters or time-of-flight filters.
In TOF, separation of secondary ions (due to m/q ratio) follows the equation:
In magnetic sector filters separation follows the equation:
MY QUESTION: All ions should enter the mass filter with the same energy at the same time. How is it done (we know that some secondary ions gain more energy some secondary ions gain less energy during sputtering)?
I know that TOF uses device called reflectron to this purpose but how about magnetic sector filters?
Could you please post a link to some good article explaining this problem.
Thanks a lot!
I have a question about secondary ions entering a mass filter in Secondary Ion Mass Sprectrometry (SIMS).
We know that secondary ions are sputtered from surface of studied sample. Those secondary ions are entering a mass filter which sort them out due to their mass/charge ratio. After that they enter a deterctor.
We use quadrupole mass filters, magnetic sector filters or time-of-flight filters.
In TOF, separation of secondary ions (due to m/q ratio) follows the equation:
In magnetic sector filters separation follows the equation:
MY QUESTION: All ions should enter the mass filter with the same energy at the same time. How is it done (we know that some secondary ions gain more energy some secondary ions gain less energy during sputtering)?
I know that TOF uses device called reflectron to this purpose but how about magnetic sector filters?
Could you please post a link to some good article explaining this problem.
Thanks a lot!
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