- #1
arierreF
- 79
- 0
[ Mod note: moved from Elec Eng, might have better luck here]
I have some basic knowledge of how FET work. But i have a question that i can't see the answer.
For example:
In a MOSFET we have a p-doped Silicon substrate. Then we have two n-doped silicons, with a oxide layer above the the p-doped Silicon substrate.
When we increase the gate voltage, we are creating a n-type channel between the n-doped silicons (called the inversion layers). The more we increase the gate voltage the more electrons can move in the n type channel.My question is, why in the recent papers, the new 2D semiconductors, like metal transition dichalcogenides, are used as n type channel?
What is their function? They increase the carriers mobility inside the channel?
I have some basic knowledge of how FET work. But i have a question that i can't see the answer.
For example:
In a MOSFET we have a p-doped Silicon substrate. Then we have two n-doped silicons, with a oxide layer above the the p-doped Silicon substrate.
When we increase the gate voltage, we are creating a n-type channel between the n-doped silicons (called the inversion layers). The more we increase the gate voltage the more electrons can move in the n type channel.My question is, why in the recent papers, the new 2D semiconductors, like metal transition dichalcogenides, are used as n type channel?
What is their function? They increase the carriers mobility inside the channel?