Field effect transistors question

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    Field Transistors
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Discussion Overview

The discussion revolves around the functioning of field effect transistors (FETs), particularly focusing on the use of 2D semiconductors like metal transition dichalcogenides as n-type channels. Participants explore the mechanisms of operation, including the effects of gate voltage on electron mobility and channel behavior in MOSFETs.

Discussion Character

  • Exploratory
  • Technical explanation
  • Debate/contested

Main Points Raised

  • Some participants note that in a MOSFET, increasing the gate voltage creates an n-type channel through inversion layers, but question the role of 2D semiconductors in this context.
  • One participant asserts that the 2D semiconductor serves as the channel itself.
  • There is confusion regarding the function of metal transition dichalcogenides and whether they enhance carrier mobility in the channel.
  • Participants discuss the effects of applying negative and positive gate biases on an n-type semiconductor channel, raising questions about the mechanisms of depletion and electron accommodation.
  • One participant references a tunnel effect FET and suggests that tunneling effects may explain electron transport from the source to the n-type semiconductor.
  • Another participant expresses uncertainty about the capacitor mechanism involving metal-dielectric-n-type semiconductor and questions how depletion can occur when the channel already contains electrons.
  • There is acknowledgment of a misunderstanding regarding the ideal conditions of an n-type semiconductor and the role of the conduction band in controlling current.

Areas of Agreement / Disagreement

Participants do not reach a consensus on the mechanisms of operation for the discussed FETs, with multiple competing views and uncertainties remaining about the role of 2D semiconductors and the effects of gate voltage.

Contextual Notes

Participants express limitations in understanding the interaction between the gate voltage and the n-type channel, particularly regarding depletion and electron dynamics. There are unresolved questions about the ideal conditions for electron behavior in the conduction band.

arierreF
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[ Mod note: moved from Elec Eng, might have better luck here]

I have some basic knowledge of how FET work. But i have a question that i can't see the answer.

For example:

In a MOSFET we have a p-doped Silicon substrate. Then we have two n-doped silicons, with a oxide layer above the the p-doped Silicon substrate.

When we increase the gate voltage, we are creating a n-type channel between the n-doped silicons (called the inversion layers). The more we increase the gate voltage the more electrons can move in the n type channel.My question is, why in the recent papers, the new 2D semiconductors, like metal transition dichalcogenides, are used as n type channel?

What is their function? They increase the carriers mobility inside the channel?
 
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The 2D semiconductor IS the channel.
 
w.shockley said:
The 2D semiconductor IS the channel.
I believe the member understands that. As I read it, the question centres on why the use of "metal transition dichalcogenides".
 
arierreF said:
What is their function? They increase the carriers mobility inside the channel?
Your question is confusing...
 
Yes the SC is the channel. But how does it works?

Suppose the we have a MOSFET with n-type semiconductor channel. Like the one that you can seei in link below.

https://www.google.pt/search?q=mos2...3%2Ffig_tab%2Fnnano.2010.279_F3.html;946;1208

We apply a negative bias in gate, so it going to repel the electrons in n-type channel semiconductor. What is the objective of repelling the electrons? Does this repelling works like the depletion (repelling it is going to reduce the width of the channel)?

And if we apply a positive bias in gate. We are accommodating electrons in the interface (n-type semiconductor channel and oxide). Whats the point of this?
 
Last edited:
They talk about a tunnel effect FET. Did you check their ref. 19, which seems to contain a description of the mechanism?
 
For what i see, the tunneling effects can explain the transport of electrons from the source to the n type semiconductor.

But what i don't understand is the mechanism of the capacitor metal-dielectric-ntype SC. I don't see how can we create any depletion here. And how can we induce electrons in the channel? when the channel has already the electrons?

Im my head, we have a ntype semiconductor without any electron in conduction band (ideal situation). If we apply the field effect, then we are giving enough energy to electrons to transit for the conduction band. Now that we have electrons in the conduction band (thinking of it as an inversion layer), we can control the current with the depletion at the drain.

I know that his is wrong, but i can't see its mechanism.
 

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