Manufacturing Electronic Products

[Paddy]

I got this assignment and I am stuck on one question, I just need a few pointers or websites with information.

Discuss the effects of altering the gate dimenstions in the MOS devices and the geometry of the bipolar transistors used.

I don't need mad calculations or complex answers, just a basic explanation, any help will be greatly appreciated.

Thank you.

EDIT::

Sorry another thing, am I correct in saying (Just checking another part of the assingment is correct) that Etching is used in small scale integrated circuits and that Diffusion and Ion Implantation is used in large scale integrated circuits?

 

[berkeman]

A good place to start is to read more about integrated circuits. Here's a reasonable introduction from wikipedia.org:

http://en.wikipedia.org/wiki/Integrated_circuit

As for gate geometry, you will want to discuss what the effects of varying the gate width and length have on the parameters of the CMOS transistor that is formed.

And AFAIK, etching and diffusion are used on all IC fabrication. I'm not sure if ion implantation is limited to some processes or not. The wikipedia pages may answer that for you.

 

[piercas]

I would like to offer my expertise and guidance on the topic of manufacturing electronic products. Altering the gate dimensions in MOS devices and the geometry of bipolar transistors can have significant effects on the performance and characteristics of these devices.

Firstly, changing the gate dimensions in MOS devices can affect the threshold voltage, which is the voltage required to turn the device on. A smaller gate length can result in a lower threshold voltage, making the device easier to turn on. This can also lead to faster switching speeds and reduced power consumption.

On the other hand, altering the geometry of bipolar transistors can impact their current gain and frequency response. A smaller base width can increase the current gain, while a smaller emitter width can improve the frequency response. However, these changes can also affect the breakdown voltage and thermal stability of the transistor.

To understand the specific effects of altering gate dimensions and transistor geometry, it is important to consider the fabrication processes involved. For example, etching is used in small scale integrated circuits to remove unwanted materials and create the desired patterns. This can affect the dimensions and characteristics of the resulting transistors. In contrast, diffusion and ion implantation are used in large scale integrated circuits to introduce impurities and modify the conductivity of the materials. These processes can also influence the transistor geometry and performance.

To gain a deeper understanding of these concepts, I suggest exploring reputable sources such as semiconductor manufacturing textbooks, journal articles, and industry websites. These resources can provide detailed explanations and examples of the effects of altering gate dimensions and transistor geometry in electronic devices.

In conclusion, the effects of altering gate dimensions and transistor geometry in MOS devices and bipolar transistors are complex and interconnected. Understanding these effects is crucial for optimizing the performance and reliability of electronic products. I hope this information helps you in your assignment. Best of luck!